Wavefront-based pixel inversion algorithm for generation of subresolution assist features

Jue Chin Yu*, Peichen Yu, Hsueh Yung Chao

*Corresponding author for this work

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

摘要

The generation of subresolution assist features (SRAFs) using inverse-lithography techniques demands extensive computational resources which limits its deployment in advanced CMOS nodes. In this paper, we propose a wavefront-based pixel inversion algorithm to quickly obtain inverse masks with a high aerial image quality. Further assisted by a flexible pattern simplification technique, we present effective SRAF generation and placement based on the calculated inverse mask. The proposed approach can be easily inserted prior to a conventional mask correction flow for subsequent concurrent optimizations of both drawn patterns and SRAFs. The innovative pixel inversion and pattern simplification techniques allow quality mask corrections as produced by inverse lithography while maintaining the convenience of standardized/validated process flows currently used in the industry.

原文English
文章編號043014
期刊Journal of Micro/Nanolithography, MEMS, and MOEMS
10
發行號4
DOIs
出版狀態Published - 1 一月 2011

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