Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

D. Gupta*, King-Ning Tu, K. W. Asai

*Corresponding author for this work

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.

原文English
頁(從 - 到)131-137
頁數7
期刊Thin Solid Films
90
發行號2
DOIs
出版狀態Published - 16 四月 1982

指紋 深入研究「Tracer diffusion in amorphous Pd<sub>80</sub>Si<sub>20</sub> and Gd<sub>16</sub>Co<sub>84</sub> films」主題。共同形成了獨特的指紋。

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