The path finding of gate dielectric breakdown in advanced high-k metal-gate CMOS devices

Steve S. Chung*

*Corresponding author for this work

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

指紋 深入研究「The path finding of gate dielectric breakdown in advanced high-k metal-gate CMOS devices」主題。共同形成了獨特的指紋。

Engineering & Materials Science