The influence of NH3 plasma treatment on Al2O 3/HfO2 gate dielectrics of TFTs with atmospheric pressure plasma jet deposited IGZO channel

Hau Yuan Huang, Chien Hung Wu*, Shui Jinn Wang, Kow-Ming Chang, Hsin Yu Hsu

*Corresponding author for this work

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

指紋 深入研究「The influence of NH<sub>3</sub> plasma treatment on Al<sub>2</sub>O <sub>3</sub>/HfO<sub>2</sub> gate dielectrics of TFTs with atmospheric pressure plasma jet deposited IGZO channel」主題。共同形成了獨特的指紋。

Engineering & Materials Science