Statistical analysis of metal gate workfunction variability, process variation, and random dopant fluctuation in nano-CMOS circuits

Chih Hong Hwang*, Tien Yeh Li, Ming Hung Han, Kuo Fu Lee, Hui Wen Cheng, Yiming Li

*Corresponding author for this work

研究成果: Conference contribution同行評審

7 引文 斯高帕斯(Scopus)

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Mathematics

Engineering & Materials Science