Stability of La2O3 metal-insulator-metal capacitors under constant voltage stress

Shu Hua Wu*, Chih Kang Deng, Tuo-Hung Hou, Bi Shiou Chiou

*Corresponding author for this work

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

In this study, we demonstrate the stability of high-κ La 2O3 metal-insulator-metal (MIM) capacitors under constant voltage stress (CVS). It was found that the variation in capacitance caused by CVS strongly depends on the injected charges regardless of stress biases. Furthermore, the quadratic voltage coefficient of capacitance (α) decreases with a logarithmic increase in dielectric loss. Charge trapping contributes to the relative capacitance variation under CVS while the reduced carrier mobility due to the stress-induced traps is responsible for the reduction of α. Additionally, high stability of 10-year lifetime is achieved for a 10-nm La2O3 MIM capacitor with an 11.4 fF/μm2 capacitance density.

原文English
文章編號04DB16
期刊Japanese Journal of Applied Physics
49
發行號4 PART 2
DOIs
出版狀態Published - 1 四月 2010

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