Source optimization incorporating margin image average with conjugate gradient method

Jue Chin Yu, Peichen Yu*, Hsueh Yung Chao

*Corresponding author for this work

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

Source optimization (SO) becomes increasingly important to resolution enhancement in sub-32 nm lithography nodes because the dense pattern configurations significantly limit the capability of mask correction. A key step in SO is the image formation by Abbe's method, which is a linear operation of integrating all source points' images incoherently to form aerial images. However, the aerial images are usually converted to resist images through the nonlinear sigmoid function. Such operation loses the merit of linearity in optimization and leads to slow convergence and time-consuming calculation. In this paper we propose a threshold-based linear resist model to replace the sigmoid model in SO. The effectiveness of our proposed model can be clearly seen from mathematical analysis. We also compare results based on linear and sigmoid models. Highly similar optimal sources are obtained, but the linear model has a significant advantage over the sigmoid in terms of convergence rate and simulation time. Furthermore, the process variations characterized by exposure-defocus (E-D) windows are still in similar trends for optimal sources based on two different resist models.

原文English
主出版物標題Optical Microlithography XXV
DOIs
出版狀態Published - 31 五月 2012
事件Optical Microlithography XXV - San Jose, CA, United States
持續時間: 13 二月 201216 二月 2012

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
8326
ISSN(列印)0277-786X

Conference

ConferenceOptical Microlithography XXV
國家United States
城市San Jose, CA
期間13/02/1216/02/12

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