Silicide Optimization for Electrostatic Discharge Protection Devices in Sub- 100 nm CMOS Circuit Design

Jam Wem Lee*, Yi-Ming Li, Howard Tang

*Corresponding author for this work

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

指紋 深入研究「Silicide Optimization for Electrostatic Discharge Protection Devices in Sub- 100 nm CMOS Circuit Design」主題。共同形成了獨特的指紋。

Engineering & Materials Science