Room temperature fabrication of titanium nitride thin films as plasmonic materials by high-power impulse magnetron sputtering

Zih Ying Yang, Yi Hsun Chen, Bo Huei Liao, Kuo-Ping Chen*

*Corresponding author for this work

研究成果: Article同行評審

20 引文 斯高帕斯(Scopus)

摘要

High-power impulse magnetron sputtering (HiPIMS) was used to deposit titanium nitride (TiN) thin films with high electron density as alternative plasmonic materials. TiN thin films with thicknesses of 20-40 nm were deposited with different average sputtering powers, and exhibited metallic- and dielectric-like optical properties. When the sputtering power was increased from 80 W to 300 W, denser polycrystalline TiN thin films were obtained at room temperature (RT) with a conductivity 25 times that of the low-sputtering-power film. With sufficient average power (≥ 180 W), the films exhibited metallic-like optical properties, and a conductivity of >105 S/m. By using HiPIMS deposition, good-quality metallic-like TiN thin films could be fabricated at RT without heating the substrate.

原文English
頁(從 - 到)540-551
頁數12
期刊Optical Materials Express
6
發行號2
DOIs
出版狀態Published - 一月 2016

指紋 深入研究「Room temperature fabrication of titanium nitride thin films as plasmonic materials by high-power impulse magnetron sputtering」主題。共同形成了獨特的指紋。

引用此