Response surface methodology applied to silicon trench etching in Cl2/HBr/O2 using transformer coupled plasma technique

C. C. Hung, Horng-Chih Lin, H. C. Shih*

*Corresponding author for this work

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

指紋 深入研究「Response surface methodology applied to silicon trench etching in Cl<sub>2</sub>/HBr/O<sub>2</sub> using transformer coupled plasma technique」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy