Removal of end-of-range defects in Ge+-pre-amorphized Si by carbon ion implantation

Peng Shiu Chen*, Tsung-Eong Hsien, Chih Hsun Chu

*Corresponding author for this work

研究成果: Article同行評審

14 引文 斯高帕斯(Scopus)

摘要

Carbon ion implantation was employed to annihilate the end-of-range (EOR) defects in Ge+-pre-amorphized Si. Experimental results showed that the efficiency of EOR defect removal depends on the Ge+-pre-amorphization conditions, the location of projected range (Rp) of carbon implant and subsequent annealing conditions. The best defect removal occurred when Rp of carbon implantation was brought close to the amorphous/crystalline (a/c) interface generated by Ge+-pre-amorphization. The higher the annealing temperature, the better the interstitial gettering efficiency of carbon atoms was observed. However, transmission electron microscopy investigation revealed the emergence of hairpin dislocations when dose and accelerating voltage of Ge+ implantation were high. In specimens without carbon implantation, the hairpin dislocations could be readily removed by a 900°C, 30 min anneal. For carbon-implanted specimens, the density of hairpin dislocations increased when Rp of carbon implantation was close to the (a/c) interface. The glide motion of hairpin dislocations was affected by Ge+-pre-amorphization conditions and was inhibited by the SiC complexes formed in the vicinity of dislocations so that they became rather difficult to anneal out of the specimens.

原文English
頁(從 - 到)3114-3119
頁數6
期刊Journal of Applied Physics
85
發行號6
DOIs
出版狀態Published - 15 三月 1999

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