Relaxation-free strained SiGe with super anneal for 32nm high performance PMOS and beyond

Ming H. Yu, J. H. Li, H. H. Lin, C. H. Chen, K. C. Ku, C. F. Nieh, H. Hisa, Y. M. Sheu, C. W. Tsai, Y. L. Wang, H. Y. Chu, Huang-Chung Cheng, T. L. Lee, S. C. Chen, M. S. Liang

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5 引文 斯高帕斯(Scopus)

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