Relation between the plasma characteristics and physical properties of functional zinc oxide thin film prepared by radio frequency magnetron sputtering process

Che Wei Hsu, Tsung Chieh Cheng, Wen Hsien Huang, Jong-Shinn Wu*, Cheng Chih Cheng, Kai Wen Cheng, Shih Chiang Huang

*Corresponding author for this work

研究成果: Article同行評審

21 引文 斯高帕斯(Scopus)

摘要

The ZnO thin film was deposited on a glass substrate by a RF reactive magnetron sputtering method. Results showed that plasma density, electron temperature, deposition rate and estimated ion bombardment energy increase with increasing applied RF power. Three distinct power regimes were observed, which are strongly correlated with plasma properties. In the low-power regime, the largest grain size was observed due to slow deposition rate. In the medium-power regime, the smallest grain size was found, which is attributed to insufficient time for the adatoms to migrate on substrate surface. In the high-power regime, relatively larger grain size was found due to very large ion bombardment energy which enhances the thermal migration of adatoms. Regardless of pure ZnO thin film or ZnO on glass, high transmittance (> 80%) in the visible region can be generally observed. However, the film thickness plays a more important role for controlling optical properties, especially in the UV region, than the applied RF power. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, is of good anti-UV characteristics, and is highly hydrophobic, which is highly suitable for applications in the glass industry.

原文English
頁(從 - 到)1953-1957
頁數5
期刊Thin Solid Films
518
發行號8
DOIs
出版狀態Published - 1 二月 2010

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