Reactive ion etching of ZnO using the H2/CH4 and H2/CH4/Ar mixtures

Kuang Po Hsueh*, Ren Jie Hou, Cheng-Huang Kuo, Chun Ju Tun

*Corresponding author for this work

研究成果: Conference article同行評審

指紋 深入研究「Reactive ion etching of ZnO using the H<sub>2</sub>/CH<sub>4</sub> and H<sub>2</sub>/CH<sub>4</sub>/Ar mixtures」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Mathematics

Physics & Astronomy