Properties of polycrystalline diamond as X-ray mask

Jeng-Tzong Sheu*, G. Y. Yang, B. R. Huang

*Corresponding author for this work

研究成果: Conference article同行評審

2 引文 斯高帕斯(Scopus)

摘要

1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

原文English
頁(從 - 到)173-175
頁數3
期刊Proceedings of SPIE - The International Society for Optical Engineering
3512
DOIs
出版狀態Published - 1 十二月 1998
事件Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining - Santa Clara, CA, USA
持續時間: 21 九月 199822 九月 1998

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