Properties of highly resistive and nonstoichiometric GaAs film grown by low-temperature metalorganic chemical vapor deposition using tertiarybutylarsine

Wen Chung Chen, C. S. Chang*, Wei-Kuo Chen

*Corresponding author for this work

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

指紋 深入研究「Properties of highly resistive and nonstoichiometric GaAs film grown by low-temperature metalorganic chemical vapor deposition using tertiarybutylarsine」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Physics & Astronomy