Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography

H. L. Chen, C. W. Tu, T. J. Wang, Po-Tsun Liu, Fu-Hsiang Ko, T. C. Chung

研究成果: Conference contribution同行評審

摘要

In this paper, optical characteristics of porous MSQ were measured for BARC applications. Optical constants of porous MSQ are (1.432, 0.004) and (1.245, 0.454) at 193 and 157 nm, respectively. For 157 nm, the porous MSQ film has suitable optical characteristics as a BARC layer.

原文English
主出版物標題Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
發行者Institute of Electrical and Electronics Engineers Inc.
頁面122-123
頁數2
ISBN(電子)4891140402, 9784891140403
DOIs
出版狀態Published - 1 一月 2003
事件International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
持續時間: 29 十月 200331 十月 2003

出版系列

名字Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2003
國家Japan
城市Tokyo
期間29/10/0331/10/03

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