Plasma passivation effects on polycrystalline silicon thin-film transistors utilizing nitrous oxide plasma

Fang Shing Wang*, Chun Yao Huang, Huang-Chung Cheng

*Corresponding author for this work

研究成果: Article › 同行評審

6 引文 斯高帕斯（Scopus）

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Engineering & Materials Science

Physics & Astronomy