Plasma-induced charging damage in ultrathin (3 nm) nitrided oxides

C. C. Chen*, Horng-Chih Lin, C. Y. Chang, M. S. Liang, Chao-Hsin Chien, S. K. Hsien, T. Y. Huang

*Corresponding author for this work

研究成果: Paper同行評審

3 引文 斯高帕斯(Scopus)

摘要

Plasma-induced charging damage in various 3 nm-thick gate oxides (i.e., pure oxides and N2O-nitrided oxides) was investigated by subjecting both nMOS and pMOS antenna devices to a photoresist ashing step after metal pad definition. Gate leakage current measurements indicated that large leakage current occurs at both the wafer center and the wafer edge for pMOS devices, while it occurs only at the wafer center for nMOS devices. These interesting observations could be explained by the polarity dependence of ultra-thin oxides in charge-to-breakdown characteristics. More importantly, our experimental results demonstrated that stress-induced leakage current (SILC) caused by plasma damage is significantly suppressed in N2O-nitrided oxides, compared to pure oxides, especially for pMOS devices. Finally, nitrided-oxide is also found to be more robust when subjected to high temperature stressing.

原文English
頁面141-144
頁數4
DOIs
出版狀態Published - 1 十二月 1999
事件Proceedings of the 1999 4th International Symposium on Plasma Process-Induced Damage (P2ID) - Monterey, CA, USA
持續時間: 9 五月 199911 五月 1999

Conference

ConferenceProceedings of the 1999 4th International Symposium on Plasma Process-Induced Damage (P2ID)
城市Monterey, CA, USA
期間9/05/9911/05/99

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