Photovoltaic effect on differential capacitance profiles of low-energy-BF2+-implanted silicon wafers

M. N. Chang*, C. Y. Chen, Fu-Ming Pan, J. H. Lai, W. W. Wan, J. H. Liang

*Corresponding author for this work

研究成果: Article同行評審

23 引文 斯高帕斯(Scopus)

摘要

The photovoltaic effect on differential capacitance signals of low-energy BF2+ implanted silicon wafers was studied using scanning capacitance microscopy (SCM). The observed junction image exhibited a narrower junction width due to the photovoltaic effect on the junction region. The photovoltaic effect deteriorates the accuracy of junction characterization, in particular for ultrashallow junctions and lower band-gap semiconductors.

原文English
頁(從 - 到)3955-3957
頁數3
期刊Applied Physics Letters
82
發行號22
DOIs
出版狀態Published - 2 六月 2003

指紋 深入研究「Photovoltaic effect on differential capacitance profiles of low-energy-BF<sub>2</sub><sup>+</sup>-implanted silicon wafers」主題。共同形成了獨特的指紋。

引用此