In this work, the relation between post annealing temperature and electrical characteristic on high mobility a-IZTO TFTs was investigated. The 400°C-annealed a-IZTO TFTs exhibited a better performance with field effect mobility of 39.6 cm 2 /Vs, V th of -2.8 V and sub-threshold swing of 0.25 V/decade. Both shallow trap states of a-IZTO film and interface trap states at the a-IZTO/SiO 2 interface decreased to 2.16 × 10 17 cm -3 eV -1 and 4.38 × 10 12 cm -2 eV -1 , respectively with 400°C annealing. Owing to the higher energy from annealing process, the structural relaxation can be enhanced leading a better electrical characteristic of a-IZTO TFTs.
|頁（從 - 到）||1017-1020|
|期刊||Digest of Technical Papers - SID International Symposium|
|出版狀態||Published - 1 一月 2014|