Organic thermal mode photoresists for applications in nano-lithography

Hsiu Wen Wu, Ming Chia Li, Chin Tien Yang, Chung Ta Cheng, Shuen Chen Chen, Der-Ray Huang*

*Corresponding author for this work

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

A new technology called thermal mode lithography for developing new thermal mode photoresists with temperature sensitive characteristics has been investigated. In this study, we synthesized four types of polymethine compounds that can be applied to thermal mode photoresists. The photo UV absorption and thermal properties are the important characteristics of thermal mode photoresists. The decomposition and gasification mechanisms of thermal photoresists can be analyzed by thermal properties. The surface morphology of nano-patterns can be controlled by using different laser power exposure on thermal photoresists. A cost effective way to achieve submicron or nano-structure patterns is possible.

原文English
主出版物標題Materials Processing and Interfaces
發行者Minerals, Metals and Materials Society
頁面663-668
頁數6
ISBN(列印)9781118296073
DOIs
出版狀態Published - 1 一月 2012
事件141st Annual Meeting and Exhibition, TMS 2012 - Orlando, FL, United States
持續時間: 11 三月 201215 三月 2012

出版系列

名字TMS Annual Meeting
1

Conference

Conference141st Annual Meeting and Exhibition, TMS 2012
國家United States
城市Orlando, FL
期間11/03/1215/03/12

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