On the Profile Design and Optimization of Epitaxial Si and SiGe-Base Bipolar Technology for 77 K Applications—Part II: Circuit Performance Issues

John D. Cressler, Emmanuel F. Crabbé, James H. Comfort, Johannes M. Stork, Jack Y.C. Sun

研究成果: Article同行評審

45 引文 斯高帕斯(Scopus)

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Chemical Compounds

Engineering & Materials Science