N2O plasma treatment suppressed temperature-dependent sub-threshold leakage current of amorphous indium-gallium-zinc-oxide thin film transistors

Geng Wei Chang, Ting Chang Chang*, Jhe Ciou Jhu, Tsung Ming Tsai, Yong En Syu, Kuan Chang Chang, Fu Yen Jian, Ya Chi Hung, Ya-Hsiang Tai

*Corresponding author for this work

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3 引文 斯高帕斯(Scopus)

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy