MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications

Xiongfei Yu, Chunxiang Zhu*, Hang Hu, Albert Chin, M. F. Li, B. J. Cho, Dim Lee Kwong, P. D. Foo, M. B. Yu

*Corresponding author for this work

研究成果: Conference article同行評審

摘要

The MIM capacitors with HfO2 and HfAlOx are investigated for Si RF and analog applications. The results show that both the capacitance density and voltage coefficients of capacitance (VCCs) increase with decreasing the HfO2 thickness. A high capacitance density of 13 fF/μm2 with a low leakage current and a VCC of 607 ppm/V is obtained for 10 nm HfO2 MIM capacitor, which can meet the requirement of the ITRS roadmap by 2007 for silicon RF application. On the other hand, it was found that both the capacitance density and voltage coefficients of capacitance (VCC) values of the HfAlOx MIM capacitors decrease with increasing Al2O3 concentration. The results show that HfAlOx MIM capacitor with an Al2O3 mole fraction of 0.14 is optimized. It provides a high capacitance density of 3.5 fF/μm2 and a low VCC of ∼140 ppm/V2. Also, small frequency dependence, low leakage current, and low loss tangent are obtained. Thus, the HfAlOx MIM capacitor with an Al2O3 mole ratio of 0.14 is very suitable for use in silicon analog applications.

原文English
頁(從 - 到)357-362
頁數6
期刊Materials Research Society Symposium - Proceedings
766
DOIs
出版狀態Published - 1 十二月 2003
事件Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics - 2003 - San Francisco, CA, United States
持續時間: 21 四月 200325 四月 2003

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