Microwave annealing for NiSiGe Schottky junction on SiGe P-channel

Yu Hsien Lin*, Yi He Tsai, Chung Chun Hsu, Guang Li Luo, Yao Jen Lee, Chao-Hsin Chien

*Corresponding author for this work

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

指紋 深入研究「Microwave annealing for NiSiGe Schottky junction on SiGe P-channel」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science