Microstructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser deposition

S. C. Chen*, K. Y. Sung, W. Y. Tzeng, Kaung-Hsiung Wu, Jenh-Yih Juang, T. M. Uen, Chih-Wei Luo, Jiunn-Yuan Lin, T. Kobayashi, Hao-Chung Kuo

*Corresponding author for this work

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

摘要

Different oxidation states of titanium nitride thin films, including pure TiN(h 0 0), TiN1-xOx(h 0 0), Ti2O3(0 0 l) and pure anatase TiO2(0 0 l), were prepared by pulsed laser deposition with various oxygen pressures using a TiN target. Elaborative evolutions of the crystal and electronic structures of the obtained films were examined systematically by x-ray diffraction and x-ray absorption spectroscopy. We found that the Ti2O3(0 0 l) film, which was prepared at oxygen pressures , exhibited the maximum room temperature ferromagnetism (RTFM) behaviour. The bound magnetic polaron model is used to clarify the origin of RTFM in these films.

原文English
文章編號075002
頁數7
期刊Journal of Physics D: Applied Physics
46
發行號8
DOIs
出版狀態Published - 20 二月 2013

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