Interface Characterization of HfO2/GaSb MOS Capacitors with Ultrathin Equivalent Oxide Thickness by Using Hydrogen Plasma Treatment

Ming Li Tsai, Jun Yu Ko, Shin Yuan Wang, Chao-Hsin Chien

研究成果: Article同行評審

7 引文 斯高帕斯(Scopus)

指紋 深入研究「Interface Characterization of HfO<sub>2</sub>/GaSb MOS Capacitors with Ultrathin Equivalent Oxide Thickness by Using Hydrogen Plasma Treatment」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science