Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction

Jue Chin Yu*, Pei-Chen Yu, Hsueh Yung Chao

*Corresponding author for this work

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

We propose an inversion calculation method based on a simple "pixel-flipping" approach. The simple method features innovative wavefront-expansion and wavefront-based damping techniques in order to obtain accentuated corrections near the drawn pattern. The method is first employed to be a stand-alone optical proximity correction solution that directly calculates the corrected masks with acceptable contours and image contrast. In addition, a model-based pre-OPC flow, where the initial sizing of drawn patterns and surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using this inversion calculation is also proposed to minimize technology-transition risks and costs. A mask simplification technique based on the central moments is introduced in order to snap the corrections into 45 degree and axis-aligned line segments. This approach allows achieving optimized corrections while minimizing the impact to the existing and validated correction flow.

原文English
主出版物標題Optical Microlithography XXII
DOIs
出版狀態Published - 29 五月 2009
事件Optical Microlithography XXII - San Jose, CA, United States
持續時間: 24 二月 200927 二月 2009

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7274
ISSN(列印)0277-786X

Conference

ConferenceOptical Microlithography XXII
國家United States
城市San Jose, CA
期間24/02/0927/02/09

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