Incorporating yttrium into a GeO interfacial layer with HfO2-based gate stack on Ge

Chen Han Chou, Yu Hong Lu, Yi He Tsai, An Shih Shih, Wen Kuan Yeh, Chao Hsin Chien*

*Corresponding author for this work

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

指紋 深入研究「Incorporating yttrium into a GeO interfacial layer with HfO<sub>2</sub>-based gate stack on Ge」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science