Improving Interface State Density and Thermal Stability of High-κ Gate Stack Through High-Vacuum Annealing on Si0.5Ge0.5

Wei Li Lee, Cheng Yu Yu, Jun Lin Zhang, Guang Li Luo, Chao-Hsin Chien*

*Corresponding author for this work

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds