H2 and NH3 plasma passivation on poly-Si TFTs with bottom-sub-gate induced electrical junctions

Cheng Ming Yu, Horng-Chih Lin*, Tiao Yuan Huang, Tan Fu Lei

*Corresponding author for this work

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

指紋 深入研究「H<sub>2</sub> and NH<sub>3</sub> plasma passivation on poly-Si TFTs with bottom-sub-gate induced electrical junctions」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy