High separation rate of epitaxial lift-off using hydrophilic solvent for III-V solar cell and reusable applications

Ray-Hua Horng, Fan Lei Wu, Sin Liang Ou, Yu Cheng Kao

研究成果: Conference contribution

1 引文 斯高帕斯(Scopus)

摘要

Through the epitaxial lift-off (ELO) process using the HF solutions mixed with hydrophilic substances consisting of acetone (ACE), isopropanol (IPA), and methanol (MA), the separation rate for the GaAs substrate and the III-V solar cell can be improved significantly. Especially for the use of HF:ACE etchant, a extremely high lateral etching rate (14.3 μm/min) of the AlAs sacrificial layer can be achieved, as compared with that employing the pure HF etchant (3.6 μm/min). In addition, by conducting the ELO technique, the GaAs substrate was reused for four times, indicating its high potential for the reusable applications.

原文English
主出版物標題2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781479979448
DOIs
出版狀態Published - 14 十二月 2015
事件42nd IEEE Photovoltaic Specialist Conference, PVSC 2015 - New Orleans, United States
持續時間: 14 六月 201519 六月 2015

出版系列

名字2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015

Conference

Conference42nd IEEE Photovoltaic Specialist Conference, PVSC 2015
國家United States
城市New Orleans
期間14/06/1519/06/15

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