Future of silicon integrated circuit technology

Hiroshi Iwai*

*Corresponding author for this work

研究成果: Conference contribution同行評審

5 引文 斯高帕斯(Scopus)

摘要

CMOS technology has been developed into the sub-100 nm range. It is expected that the nano-CMOS technology will governed the IC manufacturing for at least another couple of decades. Though there are many challenges ahead, further down-sizing the device to a few nanometers is still on the schedule of International Technology Roadmap for Semiconductors (ITRS). Several technological options for manufacturing nano-CMOS microchips have been available or will soon be available. This paper reviews the challenges of nano-CMOS downsizing and manufacturing. We shall focus on the recent progress on the key technologies for the nano-CMOS IC fabrication in the next fifteen years.

原文English
主出版物標題ICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007, Conference Proceedings
頁面571-576
頁數6
DOIs
出版狀態Published - 2007
事件ICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007 - Peradeniya, Sri Lanka
持續時間: 9 八月 200711 八月 2007

出版系列

名字ICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007, Conference Proceedings

Conference

ConferenceICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007
國家Sri Lanka
城市Peradeniya
期間9/08/0711/08/07

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