Fast converging inverse lithography algorithm incorporating image gradient descent methods

Jue Chin Yu*, Peichen Yu

*Corresponding author for this work

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

In this paper, we develop an image-gradient-based algorithm to simultaneously optimize various cost functions for inverse mask design. The algorithm employs an iterative approach which evaluates the gradient decent of the resist image, aerial image, and the aerial image contrast with a pre-assigned step length. Moreover, an independent iteration step is inserted among iterations for binary mask conversion. We show that the proposed algorithm allows fast convergence while achieving high aerial image contrast. The impacts of each cost function on the pattern fidelity and convergence are also discussed.

原文English
主出版物標題Lithography Asia 2009
DOIs
出版狀態Published - 1 十二月 2009
事件2009 Lithography Asia Conference - Taipei, Taiwan
持續時間: 18 十一月 200919 十一月 2009

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7520
ISSN(列印)0277-786X

Conference

Conference2009 Lithography Asia Conference
國家Taiwan
城市Taipei
期間18/11/0919/11/09

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