Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography

Ying Yu Lai, Akihiro Matsutani, Tien-chang Lu*, Shing Chung Wang, Fumio Koyama

*Corresponding author for this work

研究成果: Conference contribution同行評審

6 引文 斯高帕斯(Scopus)

摘要

We designed and fabricated a suspended SiC-based membrane high contrast grating (HCG) reflectors. The rigorous coupled-wave analysis (RCWA) was employed to verify the structural parameters including grating periods, grating height, filling factors and air-gap height. From the optimized simulation results, the designed SiC-based membrane HCG has a wide reflection stopband (reflectivity (R) <90%) of 135 nm for the TE polarization, which centered at 480 nm. The suspended SiC-based membrane HCG reflectors were fabricated by nanoimprint lithography and two-step etching technique. The corresponding reflectivity was measured by using a micro-reflectivity spectrometer. The experimental results show a high reflectivity (R<90%), which is in good agreement with simulation results. This achievement should have an impact on numerous III-N based photonic devices operating in the blue wavelength or even ultraviolet region.

原文English
主出版物標題High Contrast Metastructures IV
編輯Weimin Zhou, Fumio Koyama, Connie J. Chang-Hasnain, David Fattal
發行者SPIE
ISBN(電子)9781628414622
DOIs
出版狀態Published - 1 一月 2015
事件High Contrast Metastructures IV - San Francisco, United States
持續時間: 11 二月 201512 二月 2015

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
9372
ISSN(列印)0277-786X
ISSN(電子)1996-756X

Conference

ConferenceHigh Contrast Metastructures IV
國家United States
城市San Francisco
期間11/02/1512/02/15

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