Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition

H. L. Chen*, H. F. Lee, W. C. Chao, C. I. Hsieh, Fu-Hsiang Ko, T. C. Chu

*Corresponding author for this work

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

摘要

The high-density-plasma chemical vapor deposition (HDP-CVD) method was demonstrated as an alternativec to radio-frequency (if) bias sputtering method for fabrication of "autocloned" photonic crystals. We successfully preserved periodic surface corrugation after deposition of multilayer stacks under appropriate chemical vapor deposition conditions. Freedom of the shaping process was increased by simply raising the bias power of the autocloning process, and thus created autocloned structures having a strong modulation of the effective refractive index in the lateral direction. The method allows photonic bands of autocloned photonic crystals to be designed with greater controllability and a simpler fabrication process. Furthermore, the HDP-CVD method has better step-coverage than the sputtering method and can be used to fabricate autocloning structures with small feature-sizes.

原文English
頁(從 - 到)3359-3362
頁數4
期刊Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
22
發行號6
DOIs
出版狀態Published - 1 十一月 2004

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