Evaluation of glancing angle X-ray diffraction and MeV 4 He backscattering analyses of silicide formation

S. S. Lau*, W. K. Chu, J. W. Mayer, King-Ning Tu

*Corresponding author for this work

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57 引文 斯高帕斯(Scopus)

摘要

Nickel and palladium silicide films have been used in an evaluation of MeV 4 He backscattering, the Read X-ray camera and the Seemann-Bohlin X-ray diffractometer. Identical samples of untextured, textured and epitaxial crystalline layers have been studied by all three techniques. Backscattering spectrometry techniques give concentration ratios and and silicide layer thicknesses. Glancing angle X-ray diffraction is required for positive phase identification and structural analysis. The Seemann-Bohlin diffractometer is capable of quantitative structural analysis; however, the Read camera is adequate in phase identification of silicide formation.

原文English
頁(從 - 到)205-213
頁數9
期刊Thin Solid Films
23
發行號2
DOIs
出版狀態Published - 1 一月 1974

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