Erratum: Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (Journal of the Electrochemical Society (2003) 150 (G22))

Bing-Yue Tsui*, Chih Feng Huang

*Corresponding author for this work

研究成果: Comment/debate

1 引文 斯高帕斯(Scopus)
原文English
期刊Journal of the Electrochemical Society
150
發行號5
DOIs
出版狀態Published - 1 五月 2003

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