Enhancement of critical current density in direct-current-sputtered TlBa 2 Ca 2 Cu 3 O 9±δ superconducting thin films

Jenh-Yih Juang*, J. H. Horng, S. P. Chen, C. M. Fu, Kaung-Hsiung Wu, T. M. Uen, Y. S. Gou

*Corresponding author for this work

研究成果: Article同行評審

31 引文 斯高帕斯(Scopus)

摘要

A multistep postannealing scheme has been developed for preparing nearly single phased, c-axis oriented TlBa 2 Ca 2 Cu 3 O x (Tl-1223) superconducting thin films fabricated by the direct-current-sputtering process. Films obtained by the present process have shown, for the first time in this system, a critical current density (J c ) above 10 6 A/cm 2 at 77 K with a zero-resistance transition temperature T c0 ≈110K. The order of magnitude enhancement in J c is attributed to the improvement of film morphology which, in turn, removed most of the weak links encountered previously.

原文English
頁(從 - 到)885-887
頁數3
期刊Applied Physics Letters
66
發行號7
DOIs
出版狀態Published - 13 二月 1995

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