Electrical reliability issues of integrating low-K dielectrics with Cu metallization

Z. C. Wu, Z. W. Shiung, C. C. Wang, K. L. Fang, R. G. Wu, Y. L. Liu, Bing-Yue Tsui, M. C. Chen, W. Chang, P. F. Chou, S. M. Jang, C. H. Yu, M. S. Liang

研究成果: Conference contribution同行評審

5 引文 斯高帕斯(Scopus)

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Engineering & Materials Science