Effect of high-pressure H2O treatment on elimination of interfacial GeOX layer between ZrO2 and Ge stack

Chen Shuo Huang, Po-Tsun Liu*

*Corresponding author for this work

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

指紋 深入研究「Effect of high-pressure H<sub>2</sub>O treatment on elimination of interfacial GeO<sub>X</sub> layer between ZrO<sub>2</sub> and Ge stack」主題。共同形成了獨特的指紋。

Physics & Astronomy