Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition

Kenji Takahashi*, Muneyasu Suzuki, Takahiro Oikawa, H. D. Chen, Hiroshi Funakubo

*Corresponding author for this work

研究成果: Conference article同行評審

4 引文 斯高帕斯(Scopus)

摘要

La-Ni-O films were deposited at deposition temperature ranging from 250 to 540°C by rf magnetron sputter deposition. The effects of deposition temperature and the following heat-treatment condition on the constituent phases and characteristics of LaNiO3 films were investigated. LaNiO 3 phase was obtained at the deposition temperature of 250 and 360°C, while La-rich phase of La2NiO4 was appeared above 540°C. Crystalline phases of resultant films after the following heat-treatment strongly depended on the partial pressure of oxygen gas in ambience, i.e., in case of the heat-treatment at 800°C, diffraction peaks originated from LaNiO3 phase disappeared on XRD patterns in pure nitrogen gas ambience, while impurity peaks of NiO appeared in oxygen-excess (>50%) ambience. As a result, LaNiO3 films with high crystallinity and the same lattice parameter as the bulk one were obtained in the deposition at 360°C followed by the heat-treatment at 700°C in air.

原文English
文章編號G1.9
頁(從 - 到)35-40
頁數6
期刊Materials Research Society Symposium Proceedings
833
DOIs
出版狀態Published - 1 一月 2005
事件Materials, Intergration and Packaging Issues for High-Frequency Devices II - Boston, MA, United States
持續時間: 29 十一月 20041 十二月 2004

指紋 深入研究「Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO<sub>3</sub> films prepared by RF magnetron sputter deposition」主題。共同形成了獨特的指紋。

引用此