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Design of low-temperature CMOS-process compatible membrane fabricated with sacrificial aluminum layer for thermally isolated applications
Kow-Ming Chang
*
, Ren Jie Lin, I. Chung Deng
*
Corresponding author for this work
國立交通大學
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引文 斯高帕斯(Scopus)
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Chemical Compounds
Aluminum
Wet etching
Residual stresses
Membranes
Anchors
Bolometers
Stiction
Surface micromachining
Microstructure
Temperature
Gravitation
Throughput
Experiments
Engineering & Materials Science
Wet etching
Residual stresses
Membranes
Aluminum
Anchors
Bolometers
Stiction
Surface micromachining
Microstructure
Temperature
Gravitation
Throughput
Experiments
Physics & Astronomy
CMOS
membranes
residual stress
aluminum
simulation
etching
stiction
microstructure
bolometers
micromachining
profiles
selectivity
gravitation