Deposition of molybdenum carbonitride thin films from Mo(NBut)2 (NHBut)2

Hsin-Tien Chiu, Wen Yu Ho, Shiow Huey Chuang

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

Mo(NBut)2(NHBut)2 is used as a single-source precursor to deposit thin films of cubic phase molybdenum carbonitride, MoQN (x: 0.2-0.55, y: 0.1-0.47), by chemical vapor deposition on silicon substrates. In general, the C/Mo ratios increased from 0.2 to 0.55 and the N/Mo ratios decreased from 0.47 to 0.1 with increasing the temperature of deposition from 773 to 923 K. Based on the elemental composition and the composition of the gas phase products, it is proposed that the carbon atoms were incorporated through 3-methyl activation of the ligands.

原文English
頁(從 - 到)1622-1624
頁數3
期刊Journal of Materials Research
9
發行號7
DOIs
出版狀態Published - 1 一月 1994

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