Dependence of Plasma-Induced Oxide Charging Current on Al Antenna Geometry

Hyungcheol Shin, Chen-Ming Hu

研究成果: Article同行評審

40 引文 斯高帕斯(Scopus)

摘要

The dependence of the plasma-induced oxide charging current on Al electrode geometry has been studied. The stress current is collected only through the electrode surfaces not covered by the photoresist during plasma processes, and therefore is proportional to the edge length of the electrode during etching and proportional to the electrode area during photoresist ashing. Knowing the measured oxide charging currents, one should be able to predict the impact of these processes on oxide integrity and interface stability for a given antenna geometry more accurately.

原文English
頁(從 - 到)600-602
頁數3
期刊IEEE Electron Device Letters
13
發行號12
DOIs
出版狀態Published - 1 一月 1992

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