Deep etch of GaP using high-density plasma for light-emitting diode applications

D. S. Wuu*, C. R. Chung, Y. H. Liu, Ray-Hua Horng, S. H. Huang

*Corresponding author for this work

研究成果: Conference article同行評審

6 引文 斯高帕斯(Scopus)

指紋 深入研究「Deep etch of GaP using high-density plasma for light-emitting diode applications」主題。共同形成了獨特的指紋。

Physics & Astronomy

Engineering & Materials Science