Common-centroid FinFET placement considering the impact of gate misalignment

Po Hsun Wu, Po-Hung Lin, X. Li, Tsung Yi Ho

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

指紋 深入研究「Common-centroid FinFET placement considering the impact of gate misalignment」主題。共同形成了獨特的指紋。

Engineering & Materials Science