Chemical precursor for the synthesis of diamond films at low temperature

Rajanish N. Tiwari, Li Chang

研究成果: Article同行評審

8 引文 斯高帕斯(Scopus)

摘要

In this study, diamond films have been synthesized on adamantane-coated (100) Si substrates at 530 °C by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen. Scanning electron microscopy, Raman spectroscopy, and X-ray diffraction were employed to characterize the carbon chemical species on the Si substrate from adamantane into diamond. These measurements provide definitive evidence for formation of high-crystalline diamond film on Si substrate without any other pretreatments. Moreover, the possible mechanisms for the diamond formation are presented.

原文English
文章編號045501
頁數3
期刊Applied Physics Express
3
發行號4
DOIs
出版狀態Published - 1 四月 2010

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