Analysis of Hydroxyl Radical and Hydrogen Peroxide Generated in Helium-Based Atmospheric-Pressure Plasma Jet and in Different Solutions Treated by Plasma for Bioapplications

Tsung Wen Chen, Chih Tung Liu, Chao Yu Chen, Mu Chien Wu, Po Chien Chien, Yun Chien Cheng, Jong Shinn Wu

研究成果: Article同行評審

摘要

This study systematically analyzed reactive species generated with self-built helium-based lowerature atmospheric-pressure plasma jet (He-APPJ); we measured the hydroxyl radical (•OH) and hydrogen peroxide (H2O2) above surfaces of plasma-treating solutions and in plasma-treated medium (PTM) of different solutions, including deionized water, phosphate buffered saline, and Dulbecco's modified Eagle medium. The effects of adding O2 into He working gas on •OH and H2O2 generation were discussed. The MCF7 cell responses to plasma treatment were also observed. The •OH emission (309 nm) in He-APPJ and above surfaces of plasma-treating solutions were analyzed through optical emission spectroscopy, and concentrations of •OH and H2O2 in different solutions were measured using terephthalic acid and Amplex Red, respectively. In our plasma system, it was observed that higher conductivity of solutions may cause stronger •OH emission above solution. The ingredients of the solution may affect the concentrations of •OH and H2O2. Addition of 0.1% O2 generates strongest •OH emission above surfaces of plasma-treating solution with our He-APPJ, and thus, the highest H2O2 concentration in PTM. The MCF7 cell viability is influenced by the H2O2 concentration in PTM. The results of this study can facilitate further study of plasma effects on PTM and cell culture.

原文English
文章編號115002
期刊ECS Journal of Solid State Science and Technology
9
發行號11
DOIs
出版狀態Published - 12 一月 2020

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